Representative before the EPO

Employment test 51 - 200 employees
Company dna muller bore deufel schon hertel
operating since 1900
Headquarter in Munich and 1 office
active in Legal Services, IP Consulting, IP Portfolio Processing, and IP-related Communication Service

Ulrich Hoffmanns has worked on the following 7 EPO patent applications which have been published in the last five years:

EP10834579

PROCESS FOR PRODUCING FLUOROCOPOLYMER NANOCOMPOSITE

IPC classification:
C08F 214/26, C08J 5/18, C08K 3/00, C08K 3/34, C08K 5/06, C08L 27/18
Applicant:
Asahi Glass Company Ltd
Agent:
Ulrich Hoffmanns, Müller-Boré & Partner Patentanwälte PartG mbB
Status:
APPLICATION DEEMED TO BE WITHDRAWN
EP11806881

PROCESS FOR PRODUCING METAMATERIAL, AND METAMATERIAL

IPC classification:
C23C 14/04, C23C 16/04, G02B 5/30
Applicant:
Asahi Glass Company Ltd
Agent:
Ulrich Hoffmanns, Müller-Boré & Partner Patentanwälte PartG mbB
Status:
APPLICATION WITHDRAWN
EP11830700

AL-BASED ALLOY SPUTTERING TARGET AND PRODUCTION METHOD OF SAME

IPC classification:
B22F 3/115, B22F 3/15, B22F 3/24, C22C 1/02, C22C 1/04, C22C 21/00, C22F 1/00, C23C 14/34
Applicant:
Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel Ltd)
Agent:
Ulrich Hoffmanns, Müller-Boré & Partner Patentanwälte PartG mbB
Status:
APPLICATION WITHDRAWN
EP11854159

STEEL WIRE MATERIAL AND PRODUCTION METHOD FOR SAME

IPC classification:
B21B 1/16, B21B 3/00, C21D 1/74, C21D 8/06, C21D 9/52, C22C 38/00, C22C 38/02, C22C 38/04, C22C 38/06, C22C 38/08, C22C 38/12, C22C 38/14, C22C 38/16, C22C 38/20, C22C 38/42, C22C 38/50, C22C 38/54
Applicant:
Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel Ltd)
Agent:
Ulrich Hoffmanns, Müller-Boré & Partner Patentanwälte PartG mbB
Status:
EXAMINATION IN PROGRESS
EP10836046

MULTILAYER MIRROR FOR EUV LITHOGRAPHY AND PROCESS FOR PRODUCING SAME

IPC classification:
B82Y 10/00, B82Y 40/00, G02B 5/08, G03F 1/24, G03F 7/20
Applicant:
Asahi Glass Company Ltd
Agent:
Ulrich Hoffmanns, Müller-Boré & Partner Patentanwälte PartG mbB
Status:
APPLICATION DEEMED TO BE WITHDRAWN
EP10836043

REFLECTIVE-LAYER-EQUIPPED SUBSTRATE FOR EUV LITHOGRAPHY, REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY, REFLECTIVE MASK FOR EUV LITHOGRAPHY, AND PROCESS FOR PRODUCING REFLECTIVE-LAYER-EQUIPPED SUBSTRATE

IPC classification:
B82Y 10/00, B82Y 40/00, G02B 5/08, G03F 1/24, G03F 7/20
Applicant:
Asahi Glass Company Ltd
Agent:
Ulrich Hoffmanns, Müller-Boré & Partner Patentanwälte PartG mbB
Status:
APPLICATION DEEMED TO BE WITHDRAWN
EP11736773

COMPOUND WITH TRIPHENYLAMINE STRUCTURE, AND ORGANIC ELECTROLUMINESCENT ELEMENT

IPC classification:
C07C 211/54, C07C 211/56, C07D 209/86, C09K 11/06, H01L 51/50
Agent:
Ulrich Hoffmanns, Müller-Boré & Partner Patentanwälte PartG mbB
Status:
PATENT GRANTED

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