pronovem has worked on the following 1 EPO patent applications which have been published in the last five years:

EP11168942

Method for detecting embedded voids in a semiconductor substrate

IPC classification:
H01L 21/288, H01L 21/66, H01L 21/768
Applicant:
IMEC VZW
Agent:
Pronovem Office van Malderen
Status:
APPLICATION DEEMED TO BE WITHDRAWN

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