Representative before the EPO

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Petrus Henricus Johannes Broeken has worked on the following 2 EPO patent applications which have been published in the last five years:

EP13724291

PHOTON SOURCE, METROLOGY APPARATUS, LITHOGRAPHIC SYSTEM AND DEVICE MANUFACTURING METHOD

IPC classification:
G01N 21/956, G03F 7/20, H01J 61/02, H01J 61/54, H01J 65/04, H05B 41/38, H05G 2/00
Applicant:
ASML Netherlands B.V.
Agent:
Petrus Henricus Johannes Broeken, ASML Netherlands B.V.
Status:
GRANT OF PATENT INTENDED
EP14748178

METHOD OF DESIGNING METROLOGY TARGETS, SUBSTRATES HAVING METROLOGY TARGETS, METHOD OF MEASURING OVERLAY, AND DEVICE MANUFACTURING METHOD

IPC classification:
G03F 7/20
Applicant:
ASML Netherlands B.V.
Agent:
Petrus Henricus Johannes Broeken, ASML Netherlands B.V.
Status:
EXAMINATION REQUESTED

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