Representative before the EPO

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We have observed 3 EP applications Petrus Henricus Johannes Broeken has served for within the last five+ years. (We consider all applications which have an EP A1 publication dated after January 23, 2013). Please note, that we only count EP applications, in which the name of the patent attorney is explicitly mentioned as representative. These EP applications are:

EP13724291

PHOTON SOURCE, METROLOGY APPARATUS, LITHOGRAPHIC SYSTEM AND DEVICE MANUFACTURING METHOD

IPC classification:
G01N 21/956, G03F 7/20, H01J 61/02, H01J 61/54, H01J 65/04, H05B 41/38, H05G 2/00
Applicant:
ASML Netherlands B.V.
Agent:
Petrus Henricus Johannes Broeken, ASML Netherlands B.V.
Status:
GRANT OF PATENT INTENDED
EP14748178

METHOD OF DESIGNING METROLOGY TARGETS, SUBSTRATES HAVING METROLOGY TARGETS, METHOD OF MEASURING OVERLAY, AND DEVICE MANUFACTURING METHOD

IPC classification:
G03F 7/20
Applicant:
ASML Netherlands B.V.
Agent:
Petrus Henricus Johannes Broeken, ASML Netherlands B.V.
Status:
EXAMINATION REQUESTED
EP15787614

METROLOGY METHOD, COMPUTER PRODUCT AND SYSTEM

IPC classification:
G03F 7/20
Applicant:
ASML Netherlands B.V.
Agent:
Petrus Henricus Johannes Broeken, ASML Netherlands B.V.
Status:
Request for examination was made

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