We have observed
18 EP applications
Petrus Henricus Johannes Broeken
has served for within the last five+ years.
(We consider all applications which have an EP A1 or A2 publication dated after July 19, 2013).
Please note, that we only count EP applications,
in which the name of the patent attorney is explicitly mentioned as representative.
These EP applications are:
PHOTON SOURCE, METROLOGY APPARATUS, LITHOGRAPHIC SYSTEM AND DEVICE MANUFACTURING METHOD
METHOD OF DESIGNING METROLOGY TARGETS, SUBSTRATES HAVING METROLOGY TARGETS, METHOD OF MEASURING OVERLAY, AND DEVICE MANUFACTURING METHOD
METROLOGY METHOD, COMPUTER PRODUCT AND SYSTEM
ILLUMINATION SOURCE FOR AN INSPECTION APPARATUS, INSPECTION APPARATUS AND INSPECTION METHOD
DEVICE AND METHOD FOR PROCESSING A RADIATION BEAM WITH COHERENCE
METROLOGY METHOD, APPARATUS AND COMPUTER PROGRAM
METROLOGY RECIPE SELECTION
METHOD OF INSPECTING A SUBSTRATE, METROLOGY APPARATUS, AND LITHOGRAPHIC SYSTEM
METHOD AND APPARATUS FOR MEASURING A PARAMETER OF A LITHOGRAPHIC PROCESS, COMPUTER PROGRAM PRODUCTS FOR IMPLEMENTING SUCH METHODS & APPARATUS
MEASUREMENT SYSTEM, LITHOGRAPHIC SYSTEM, AND METHOD OF MEASURING A TARGET
METHOD OF MEASURING A TARGET, METROLOGY APPARATUS, POLARIZER ASSEMBLY
METHODS AND APPARATUS FOR PREDICTING PERFORMANCE OF A MEASUREMENT METHOD, MEASUREMENT METHOD AND APPARATUS
METHOD OF MEASURING A STRUCTURE, INSPECTION APPARATUS, LITHOGRAPHIC SYSTEM AND DEVICE MANUFACTURING METHOD
METHOD FOR MONITORING A CHARACTERISTIC OF ILLUMINATION FROM A METROLOGY APPARATUS
METHOD OF MEASURING A PROPERTY OF A SUBSTRATE, INSPECTION APPARATUS, LITHOGRAPHIC SYSTEM AND DEVICE MANUFACTURING METHOD