Representative before the EPO

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Technology Company

Jan-Piet van de Ven has worked on the following 4 EPO patent applications which have been published in the last five years:

EP13773770

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

IPC classification:
G03F 7/20
Applicant:
ASML Netherlands B.V.
Agent:
Jan-Piet van de Ven, ASML Netherlands B.V.
Status:
GRANT OF PATENT INTENDED
EP13795747

LITHOGRAPHIC APPARATUS, SUBSTRATE SUPPORT SYSTEM, DEVICE MANUFACTURING METHOD AND CONTROL PROGRAM

IPC classification:
G03F 7/20
Applicant:
ASML Netherlands B.V.
Agent:
Jan-Piet van de Ven, ASML Netherlands B.V.
Status:
GRANT OF PATENT INTENDED
EP14724011

ALIGNMENT SENSOR, LITHOGRAPHIC APPARATUS AND ALIGNMENT METHOD

IPC classification:
G03F 9/00
Applicant:
ASML Netherlands B.V.
Agent:
Jan-Piet van de Ven, ASML Netherlands B.V.
Status:
PATENT GRANTED
EP14727171

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

IPC classification:
G03F 7/20, H01F 13/00, H02K 41/02
Applicant:
ASML Netherlands B.V.
Agent:
Jan-Piet van de Ven, ASML Netherlands B.V.
Status:
GRANT OF PATENT INTENDED

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