Representative before the EPO

Technology company logo thumb
no operation time available
2 offices
Technology Company

We have observed 4 EP applications Jan-Piet van de Ven has served for within the last five+ years. (We consider all applications which have an EP A1 or A2 publication dated after August 21, 2013). Please note, that we only count EP applications, in which the name of the patent attorney is explicitly mentioned as representative. These EP applications are:

EP13773770

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

IPC classification:
G03F 7/20
Applicant:
ASML Netherlands B.V.
Agent:
Jan-Piet van de Ven, ASML Netherlands B.V.
Status:
GRANT OF PATENT INTENDED
EP13795747

LITHOGRAPHIC APPARATUS, SUBSTRATE SUPPORT SYSTEM, DEVICE MANUFACTURING METHOD AND CONTROL PROGRAM

IPC classification:
G03F 7/20
Applicant:
ASML Netherlands B.V.
Agent:
Jan-Piet van de Ven, ASML Netherlands B.V.
Status:
GRANT OF PATENT INTENDED
EP14724011

ALIGNMENT SENSOR, LITHOGRAPHIC APPARATUS AND ALIGNMENT METHOD

IPC classification:
G03F 9/00
Applicant:
ASML Netherlands B.V.
Agent:
Jan-Piet van de Ven, ASML Netherlands B.V.
Status:
PATENT GRANTED
EP14727171

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

IPC classification:
H02K 41/02, H01F 13/00, G03F 7/20
Applicant:
ASML Netherlands B.V.
Agent:
Jan-Piet van de Ven, ASML Netherlands B.V.
Status:
The patent has been granted

Please Sign in to use this feature