Representative before the EPO

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We have observed 4 EP applications Jan-Piet van de Ven has served for within the last five+ years. (We consider all applications which have an EP A1 publication dated after February 19, 2013). Please note, that we only count EP applications, in which the name of the patent attorney is explicitly mentioned as representative. These EP applications are:

EP13773770

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

IPC classification:
G03F 7/20
Applicant:
ASML Netherlands B.V.
Agent:
Jan-Piet van de Ven, ASML Netherlands B.V.
Status:
GRANT OF PATENT INTENDED
EP13795747

LITHOGRAPHIC APPARATUS, SUBSTRATE SUPPORT SYSTEM, DEVICE MANUFACTURING METHOD AND CONTROL PROGRAM

IPC classification:
G03F 7/20
Applicant:
ASML Netherlands B.V.
Agent:
Jan-Piet van de Ven, ASML Netherlands B.V.
Status:
GRANT OF PATENT INTENDED
EP14724011

ALIGNMENT SENSOR, LITHOGRAPHIC APPARATUS AND ALIGNMENT METHOD

IPC classification:
G03F 9/00
Applicant:
ASML Netherlands B.V.
Agent:
Jan-Piet van de Ven, ASML Netherlands B.V.
Status:
PATENT GRANTED
EP14727171

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

IPC classification:
G03F 7/20, H01F 13/00, H02K 41/02
Applicant:
ASML Netherlands B.V.
Agent:
Jan-Piet van de Ven, ASML Netherlands B.V.
Status:
GRANT OF PATENT INTENDED

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