Partner/Owner

Representative before the EPO

Employment test 1 - 10 employees
Company dna bonsmann bonsmann frank
no operation time available
Headquarter in Mönchengladbach and 1 office
active in Legal Services and IP Consulting

Hartmut Frank has worked on the following 17 EPO patent applications which have been published in the last five years:

EP11720415

OPTICAL SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION APPARATUS

IPC classification:
G03F 7/20
Applicant:
Carl Zeiss SMT GmbH
Agent:
Hartmut Frank, Bonsmann Bonsmann Frank
Status:
APPLICATION REFUSED
EP12187461

A method of producing a reflection transfer for transferring a motif onto a substrate

IPC classification:
B44C 1/17, B44F 1/02
Agent:
Hartmut Frank, Bonsmann Bonsmann Frank
Agent:
Stefan Harmuth, Harmuth & Kollegen
Status:
NO OPPOSITION FILED WITHIN TIMELIMIT
EP13705402

MIRROR ARRANGEMENT, IN PARTICULAR FOR USE IN A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

IPC classification:
G02B 26/08, G03F 7/20
Applicant:
Carl Zeiss SMT GmbH
Agent:
Hartmut Frank, Bonsmann Bonsmann Frank
Status:
GRANT OF PATENT INTENDED
EP14177805

Optical system for a microlithographic projection exposure apparatus

IPC classification:
G03F 7/20
Applicant:
Carl Zeiss SMT GmbH
Agent:
Hartmut Frank, Bonsmann Bonsmann Frank
Status:
GRANT OF PATENT INTENDED
EP13717189

OPTICAL SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

IPC classification:
G03F 7/20
Applicant:
Carl Zeiss SMT GmbH
Agent:
Hartmut Frank, Bonsmann Bonsmann Frank
Status:
GRANT OF PATENT INTENDED
EP13796013

ARRANGEMENT FOR ACTUATING AT LEAST ONE OPTICAL ELEMENT IN AN OPTICAL SYSTEM

IPC classification:
G02B 7/18, G02B 7/182, G03F 7/20
Applicant:
Carl Zeiss SMT GmbH
Agent:
Hartmut Frank, Bonsmann Bonsmann Frank
Status:
GRANT OF PATENT INTENDED
EP13811826

REFLECTIVE OPTICAL ELEMENT FOR EUV LITHOGRAPHY AND METHOD OF MANUFACTURING A REFLECTIVE OPTICAL ELEMENT

IPC classification:
G02B 5/08, G03F 1/22, G03F 7/20, G21K 1/06
Applicant:
Carl Zeiss SMT GmbH
Agent:
Hartmut Frank, Bonsmann Bonsmann Frank
Status:
The patent has been granted
EP11723898

OPTICAL SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

IPC classification:
G03F 7/20
Applicant:
Carl Zeiss SMT GmbH
Agent:
Hartmut Frank, Bonsmann Bonsmann Frank
Status:
PATENT GRANTED
EP11788392

PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC EXPOSURE APPARATUS

IPC classification:
G03F 7/20
Applicant:
Carl Zeiss SMT GmbH
Agent:
Hartmut Frank, Bonsmann Bonsmann Frank
Status:
NO OPPOSITION FILED WITHIN TIMELIMIT
EP14806552

MEASURING ARRANGEMENT FOR USE WHEN DETERMINING TRAJECTORIES OF FLYING OBJECTS

IPC classification:
G01B 11/03, G01P 3/68, G03F 7/20, H05G 2/00
Applicant:
Carl Zeiss SMT GmbH
Agent:
Hartmut Frank, Bonsmann Bonsmann Frank
Status:
EXAMINATION REQUESTED
EP14814783

MEASURING ARRANGEMENT FOR MEASURING OPTICAL PROPERTIES OF A REFLECTIVE OPTICAL ELEMENT, IN PARTICULAR FOR MICROLITHOGRAPHY

IPC classification:
G01N 21/55, G01N 21/84, G02B 17/02, G03F 7/20
Applicant:
Carl Zeiss SMT GmbH
Agent:
Hartmut Frank, Bonsmann Bonsmann Frank
Status:
EXAMINATION REQUESTED
EP14825334

BEAM PROPAGATION CAMERA AND METHOD FOR LIGHT BEAM ANALYSIS

IPC classification:
B23K 26/30, G01J 1/04, G01J 1/42, G02B 27/10
Applicant:
Carl Zeiss SMT GmbH
Agent:
Hartmut Frank, Bonsmann Bonsmann Frank
Status:
EXAMINATION REQUESTED
EP15705920

METHOD FOR PRODUCING A MIRROR ELEMENT

IPC classification:
G02B 5/08, G02B 5/09, G21K 1/06
Applicant:
Carl Zeiss SMT GmbH
Agent:
Hartmut Frank, Bonsmann Bonsmann Frank
Status:
EXAMINATION REQUESTED
EP15709856

MIRROR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

IPC classification:
G02B 17/06, G03F 7/20, G21K 1/06
Applicant:
Carl Zeiss SMT GmbH
Agent:
Hartmut Frank, Bonsmann Bonsmann Frank
Status:
EXAMINATION REQUESTED
EP15711062

EUV LIGHT SOURCE FOR A LIGHTING DEVICE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

IPC classification:
G03F 7/20, G21K 1/06, H01S 3/09, H05H 7/04
Applicant:
Carl Zeiss SMT GmbH
Agent:
Hartmut Frank, Bonsmann Bonsmann Frank
Status:
EXAMINATION REQUESTED
EP15724539

SYSTEM AND METHOD FOR ANALYZING A LIGHT BEAM CONDUCTED BY A BEAM-CONDUCTING OPTICAL UNIT

IPC classification:
B23K 26/30, G01J 1/04, G01J 1/42, H01S 3/00, H05G 2/00
Applicant:
Carl Zeiss SMT GmbH
Agent:
Hartmut Frank, Bonsmann Bonsmann Frank
Status:
EXAMINATION REQUESTED
EP16199415

METHOD FOR THE TREATMENT OF A STEEL SLAG IN STEEL MAKING

IPC classification:
C04B 5/06, C21B 3/06, C21C 7/076
Agent:
Hartmut Frank, Bonsmann Bonsmann Frank
Status:
APPLICATION PUBLISHED

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