Partner/Owner

Representative before the EPO

Employment test 1 - 10 employees
Company dna bonsmann bonsmann frank
no operation time available
Headquarter in Mönchengladbach and 1 office
active in Legal Services and IP Consulting

We have observed 18 EP applications Hartmut Frank has served for within the last five+ years. (We consider all applications which have an EP A1 publication dated after December 17, 2012). Please note, that we only count EP applications, in which the name of the patent attorney is explicitly mentioned as representative. These EP applications are:

EP11720415

OPTICAL SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION APPARATUS

IPC classification:
G03F 7/20
Applicant:
Carl Zeiss SMT GmbH
Agent:
Hartmut Frank, Bonsmann Bonsmann Frank
Status:
APPLICATION REFUSED
EP12187461

A method of producing a reflection transfer for transferring a motif onto a substrate

IPC classification:
B44C 1/17, B44F 1/02
Agent:
Hartmut Frank, Bonsmann Bonsmann Frank
Agent:
Stefan Harmuth, Harmuth & Kollegen
Status:
NO OPPOSITION FILED WITHIN TIMELIMIT
EP13705402

MIRROR ARRANGEMENT, IN PARTICULAR FOR USE IN A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

IPC classification:
G02B 26/08, G03F 7/20
Applicant:
Carl Zeiss SMT GmbH
Agent:
Hartmut Frank, Bonsmann Bonsmann Frank
Status:
GRANT OF PATENT INTENDED
EP14177805

Optical system for a microlithographic projection exposure apparatus

IPC classification:
G03F 7/20
Applicant:
Carl Zeiss SMT GmbH
Agent:
Hartmut Frank, Bonsmann Bonsmann Frank
Status:
GRANT OF PATENT INTENDED
EP13717189

OPTICAL SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

IPC classification:
G03F 7/20
Applicant:
Carl Zeiss SMT GmbH
Agent:
Hartmut Frank, Bonsmann Bonsmann Frank
Status:
GRANT OF PATENT INTENDED
EP13796013

ARRANGEMENT FOR ACTUATING AT LEAST ONE OPTICAL ELEMENT IN AN OPTICAL SYSTEM

IPC classification:
G02B 7/18, G02B 7/182, G03F 7/20
Applicant:
Carl Zeiss SMT GmbH
Agent:
Hartmut Frank, Bonsmann Bonsmann Frank
Status:
GRANT OF PATENT INTENDED
EP13811826

REFLECTIVE OPTICAL ELEMENT FOR EUV LITHOGRAPHY AND METHOD OF MANUFACTURING A REFLECTIVE OPTICAL ELEMENT

IPC classification:
G02B 5/08, G03F 1/22, G03F 7/20, G21K 1/06
Applicant:
Carl Zeiss SMT GmbH
Agent:
Hartmut Frank, Bonsmann Bonsmann Frank
Status:
The patent has been granted
EP11723898

OPTICAL SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

IPC classification:
G03F 7/20
Applicant:
Carl Zeiss SMT GmbH
Agent:
Hartmut Frank, Bonsmann Bonsmann Frank
Status:
PATENT GRANTED
EP11788392

PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC EXPOSURE APPARATUS

IPC classification:
G03F 7/20
Applicant:
Carl Zeiss SMT GmbH
Agent:
Hartmut Frank, Bonsmann Bonsmann Frank
Status:
NO OPPOSITION FILED WITHIN TIMELIMIT
EP14806552

MEASURING ARRANGEMENT FOR USE WHEN DETERMINING TRAJECTORIES OF FLYING OBJECTS

IPC classification:
G01B 11/03, G01P 3/68, G03F 7/20, H05G 2/00
Applicant:
Carl Zeiss SMT GmbH
Agent:
Hartmut Frank, Bonsmann Bonsmann Frank
Status:
EXAMINATION REQUESTED
EP14814783

MEASURING ARRANGEMENT FOR MEASURING OPTICAL PROPERTIES OF A REFLECTIVE OPTICAL ELEMENT, IN PARTICULAR FOR MICROLITHOGRAPHY

IPC classification:
G01N 21/55, G01N 21/84, G02B 17/02, G03F 7/20
Applicant:
Carl Zeiss SMT GmbH
Agent:
Hartmut Frank, Bonsmann Bonsmann Frank
Status:
EXAMINATION REQUESTED
EP14825334

BEAM PROPAGATION CAMERA AND METHOD FOR LIGHT BEAM ANALYSIS

IPC classification:
B23K 26/30, G01J 1/04, G01J 1/42, G02B 27/10
Applicant:
Carl Zeiss SMT GmbH
Agent:
Hartmut Frank, Bonsmann Bonsmann Frank
Status:
EXAMINATION REQUESTED
EP15705920

METHOD FOR PRODUCING A MIRROR ELEMENT

IPC classification:
G02B 5/08, G02B 5/09, G21K 1/06
Applicant:
Carl Zeiss SMT GmbH
Agent:
Hartmut Frank, Bonsmann Bonsmann Frank
Status:
EXAMINATION REQUESTED
EP11704028

METHOD FOR PRODUCING A TEXTILE PRODUCT

IPC classification:
B32B 7/04, B32B 27/12, B44C 1/00, D06H 1/04, D06Q 1/00
Agent:
Hartmut Frank, Bonsmann Bonsmann Frank
Status:
NO OPPOSITION FILED WITHIN TIMELIMIT
EP15709856

MIRROR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

IPC classification:
G02B 17/06, G03F 7/20, G21K 1/06
Applicant:
Carl Zeiss SMT GmbH
Agent:
Hartmut Frank, Bonsmann Bonsmann Frank
Status:
EXAMINATION REQUESTED
EP15711062

EUV LIGHT SOURCE FOR A LIGHTING DEVICE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

IPC classification:
G03F 7/20, G21K 1/06, H01S 3/09, H05H 7/04
Applicant:
Carl Zeiss SMT GmbH
Agent:
Hartmut Frank, Bonsmann Bonsmann Frank
Status:
EXAMINATION REQUESTED
EP15724539

SYSTEM AND METHOD FOR ANALYZING A LIGHT BEAM CONDUCTED BY A BEAM-CONDUCTING OPTICAL UNIT

IPC classification:
B23K 26/30, G01J 1/04, G01J 1/42, H01S 3/00, H05G 2/00
Applicant:
Carl Zeiss SMT GmbH
Agent:
Hartmut Frank, Bonsmann Bonsmann Frank
Status:
EXAMINATION REQUESTED
EP16199415

METHOD FOR THE TREATMENT OF A STEEL SLAG IN STEEL MAKING

IPC classification:
C04B 5/06, C21B 3/06, C21C 7/076
Agent:
Hartmut Frank, Bonsmann Bonsmann Frank
Status:
APPLICATION PUBLISHED

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