We have observed
12 EP applications
has served for within the last five+ years.
(We consider all applications which have an EP A1 or A2 publication dated after January 13, 2014).
Please note, that we only count EP applications,
in which the name of the patent attorney is explicitly mentioned as representative.
These EP applications are:
SYSTEM AND METHOD FOR DETECTING A PROCESS POINT IN MULTI-MODE PULSE PROCESSES
SELECTIVE NITRIDE ETCH
ISOTROPIC ATOMIC LAYER ETCH FOR SILICON AND GERMANIUM OXIDES
ESTIMATION OF LIFETIME REMAINING FOR A CONSUMABLE-PART IN A SEMICONDUCTOR MANUFACTURING CHAMBER
LONG LIFETIME THERMAL SPRAY COATING FOR ETCHING OR DEPOSITION CHAMBER APPLICATION
EDGE RING ASSEMBLY FOR IMPROVING FEATURE PROFILE TILTING AT EXTREME EDGE OF WAFER
SEALED ELASTOMER BONDED SI ELECTRODES AND THE LIKE FOR REDUCED PARTICLE CONTAMINATION IN DIELECTRIC ETCH
GAS SUPPLY DELIVERY ARRANGEMENT INCLUDING A GAS SPLITTER FOR TUNABLE GAS FLOW CONTROL
SUBSTRATE PROCESSING SYSTEM INCLUDING A COIL WITH AN RF POWERED FARADAY SHIELD
DESIGN FOR STORING AND ORGANIZING MINIMUM CONTACT AREA FEATURES AND WAFER TRANSFER PINS DURING SYSTEM MAINTENANCE
HIGH PRODUCTIVITY DEPOSITION SYSTEM
METHODS FOR CONTROLLING THE CLAMPING OF AN INSULATOR-TYPE SUBSTRATE ON AN ELECTROSTATIC-TYPE SUBSTRATE SUPPORT STRUCTURE