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Representative before the EPO

Employment test 11 - 50 employees
Company dna denk ip bvba
operating since 2009
844.88
Headquarter in Merelbeke and 1 office
active in Legal Services, IP Consulting, and IP-related Communication Service

Christophe Ego has worked on the following 17 EPO patent applications which have been published in the last five years:

EP12728042

HIERARCHICAL CARBON NANO AND MICRO STRUCTURES

IPC classification:
B81C 1/00, C01B 31/02
Applicant:
IMEC VZW
Applicant:
Katholieke Universiteit Leuven
Agent:
Christophe Ego, DenK iP bvba
Status:
GRANT OF PATENT INTENDED
EP12168995

Graphene-based semiconductor device

IPC classification:
H01L 29/16, H01L 29/778
Applicant:
IMEC VZW
Applicant:
Katholieke Universiteit Leuven
Agent:
Christophe Ego, DenK iP bvba
Status:
EXAMINATION IN PROGRESS
EP13156019

Conformal anti-reflective coating

IPC classification:
G03F 7/09
Applicant:
IMEC VZW
Agent:
Christophe Ego, DenK iP bvba
Status:
EXAMINATION REQUESTED
EP13156397

Oxygen monolayer on a semiconductor

IPC classification:
H01L 21/02, H01L 21/316
Applicant:
IMEC VZW
Agent:
Christophe Ego, DenK iP bvba
Status:
EXAMINATION REQUESTED
EP13157812

Passivated III-V or Ge fin-shaped field effect transistor

IPC classification:
H01L 29/66, H01L 29/78
Applicant:
IMEC VZW
Agent:
Christophe Ego, DenK iP bvba
Status:
EXAMINATION REQUESTED
EP13162837

Graphene based field effect transistor

IPC classification:
H01L 29/16, H01L 29/51, H01L 29/778
Applicant:
IMEC VZW
Applicant:
Katholieke Universiteit Leuven
Agent:
Christophe Ego, DenK iP bvba
Status:
EXAMINATION IN PROGRESS
EP13155745

Semiconductor heterostructure field effect transistor and method for making thereof

IPC classification:
H01L 21/336, H01L 29/06, H01L 29/205, H01L 29/778
Applicant:
IMEC VZW
Agent:
Christophe Ego, DenK iP bvba
Status:
EXAMINATION REQUESTED
EP13177959

III-V semiconductor device with interfacial layer

IPC classification:
H01L 21/28, H01L 29/20, H01L 29/51
Applicant:
IMEC VZW
Applicant:
Katholieke Universiteit Leuven
Agent:
Christophe Ego, DenK iP bvba
Status:
NO OPPOSITION FILED WITHIN TIMELIMIT
EP13169921

Tunnel field effect transistor and method for making thereof

IPC classification:
H01L 29/06, H01L 29/205, H01L 29/51, H01L 29/739
Applicant:
IMEC VZW
Applicant:
Katholieke Universiteit Leuven
Agent:
Christophe Ego, DenK iP bvba
Status:
GRANT OF PATENT INTENDED
EP13184718

Protection of porous substrates before treatment

IPC classification:
H01L 21/3105, H01L 21/311, H01L 21/768
Applicant:
IMEC VZW
Agent:
Christophe Ego, DenK iP bvba
Status:
GRANT OF PATENT INTENDED
EP13184696

Method for transfering a graphene layer

IPC classification:
H01L 21/18
Applicant:
IMEC VZW
Agent:
Christophe Ego, DenK iP bvba
Status:
GRANT OF PATENT INTENDED
EP13186263

Layer deposition on III-V semiconductors

IPC classification:
H01L 21/02, H01L 21/314
Applicant:
IMEC VZW
Agent:
Christophe Ego, DenK iP bvba
Status:
GRANT OF PATENT INTENDED
EP13188450

Electrical polynucleotide mapping

IPC classification:
B01L 3/00, C12Q 1/68, G01N 33/487
Applicant:
IMEC VZW
Applicant:
Katholieke Universiteit Leuven
Agent:
Christophe Ego, DenK iP bvba
Status:
APPLICATION DEEMED TO BE WITHDRAWN
EP13197472

Method for activating a porous layer surface

IPC classification:
H01L 21/3105
Applicant:
IMEC VZW
Applicant:
Katholieke Universiteit Leuven
Agent:
Christophe Ego, DenK iP bvba
Status:
GRANT OF PATENT INTENDED
EP14154114

A bilayer graphene tunneling field effect transistor

IPC classification:
H01L 29/423, H01L 29/786
Applicant:
IMEC VZW
Applicant:
Katholieke Universiteit Leuven
Agent:
Christophe Ego, DenK iP bvba
Status:
GRANT OF PATENT INTENDED
EP12172125

Method for growing nanostructures in recessed structures

IPC classification:
B82Y 10/00, H01L 51/00, H01L 51/05
Applicant:
IMEC VZW
Agent:
Christophe Ego, DenK iP bvba
Status:
APPLICATION DEEMED TO BE WITHDRAWN
EP15183574

METALLIZATION METHOD FOR SEMICONDUCTOR STRUCTURES

IPC classification:
H01L 21/768
Applicant:
IMEC VZW
Agent:
Christophe Ego, DenK iP bvba
Agent:
IMEC VZW
Status:
The patent has been granted

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