Representative before the EPO

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We have observed 4 EP applications Abraham Johannes Maas has served for within the last five+ years. (We consider all applications which have an EP A1 or A2 publication dated after August 18, 2013). Please note, that we only count EP applications, in which the name of the patent attorney is explicitly mentioned as representative. These EP applications are:

EP12708271

MEASUREMENT OF THE POSITION OF A RADIATION BEAM SPOT IN LITHOGRAPHY

IPC classification:
G03F 7/20
Applicant:
ASML Netherlands B.V.
Agent:
Abraham Johannes Maas, ASML Netherlands B.V.
Status:
The patent has been granted
EP12738445

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

IPC classification:
G03F 7/20
Applicant:
ASML Netherlands B.V.
Agent:
Abraham Johannes Maas, ASML Netherlands B.V.
Status:
NO OPPOSITION FILED WITHIN TIMELIMIT
EP13720415

AN ASSEMBLY FOR MODIFYING PROPERTIES OF A PLURALITY OF RADIATION BEAMS, A LITHOGRAPHY APPARATUS, A METHOD OF MODIFYING PROPERTIES OF A PLURALITY OF RADIATION BEAMS AND A DEVICE MANUFACTURING METHOD

IPC classification:
H01S 5/14, G03F 7/20, G02B 6/00
Applicant:
ASML Netherlands B.V.
Agent:
Abraham Johannes Maas, ASML Netherlands B.V.
Status:
GRANT OF PATENT INTENDED
EP14766961

POLARIZATION INDEPENDENT INTERFEROMETER

IPC classification:
G03F 9/00
Applicant:
ASML Netherlands B.V.
Agent:
Abraham Johannes Maas, ASML Netherlands B.V.
Status:
GRANT OF PATENT INTENDED

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