We have observed
4 EP applications
Abraham Johannes Maas
has served for within the last five+ years.
(We consider all applications which have an EP A1 or A2 publication dated after May 25, 2013).
Please note, that we only count EP applications,
in which the name of the patent attorney is explicitly mentioned as representative.
These EP applications are:
MEASUREMENT OF THE POSITION OF A RADIATION BEAM SPOT IN LITHOGRAPHY
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
AN ASSEMBLY FOR MODIFYING PROPERTIES OF A PLURALITY OF RADIATION BEAMS, A LITHOGRAPHY APPARATUS, A METHOD OF MODIFYING PROPERTIES OF A PLURALITY OF RADIATION BEAMS AND A DEVICE MANUFACTURING METHOD
POLARIZATION INDEPENDENT INTERFEROMETER