Representative before the EPO

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Technology Company

Abraham Johannes Maas has worked on the following 6 EPO patent applications which have been published in the last five years:

EP12708271

MEASUREMENT OF THE POSITION OF A RADIATION BEAM SPOT IN LITHOGRAPHY

IPC classification:
G03F 7/20
Applicant:
ASML Netherlands B.V.
Agent:
Abraham Johannes Maas, ASML Netherlands B.V.
Status:
GRANT OF PATENT INTENDED
EP12738445

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

IPC classification:
G03F 7/20
Applicant:
ASML Netherlands B.V.
Agent:
Abraham Johannes Maas, ASML Netherlands B.V.
Status:
NO OPPOSITION FILED WITHIN TIMELIMIT
EP13720415

AN ASSEMBLY FOR MODIFYING PROPERTIES OF A PLURALITY OF RADIATION BEAMS, A LITHOGRAPHY APPARATUS, A METHOD OF MODIFYING PROPERTIES OF A PLURALITY OF RADIATION BEAMS AND A DEVICE MANUFACTURING METHOD

IPC classification:
G02B 6/00, G03F 7/20, H01S 5/14
Applicant:
ASML Netherlands B.V.
Agent:
Abraham Johannes Maas, ASML Netherlands B.V.
Status:
GRANT OF PATENT INTENDED
EP14766961

POLARIZATION INDEPENDENT INTERFEROMETER

IPC classification:
G03F 9/00
Applicant:
ASML Netherlands B.V.
Agent:
Abraham Johannes Maas, ASML Netherlands B.V.
Status:
GRANT OF PATENT INTENDED
EP11705506

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

IPC classification:
G03F 7/20
Applicant:
ASML Netherlands B.V.
Agent:
Abraham Johannes Maas, ASML Netherlands B.V.
Status:
PATENT GRANTED
EP11706786

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

IPC classification:
G03F 7/20
Applicant:
ASML Netherlands B.V.
Agent:
Abraham Johannes Maas, ASML Netherlands B.V.
Status:
PATENT GRANTED

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