Priority Date: 15.07.16 (US 201662363041P)

IMPROVED METHOD FOR COMPUTER MODELING AND SIMULATION OF NEGATIVE-TONE-DEVELOPABLE PHOTORESISTS

  • Application ID: EP17828585
  • Status: Request for examination was made

Applicant

Technology company logo small
Technology Company

Attorney

Employment test 51 - 200 employees
Company dna frkelly
operating since 1927
Headquarter in Dublin and 1 office
active in Legal Services

Specialization

This EP application has the IPC class G03 (PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY). Here you find a list of all patent agent firms which are specialized in this IPC class. For a similar patent, they might be a good choice.

Timeline

  • 15.07.2016 - Priority Date (US 201662363041P)
  • 18.01.2018 - Publication A1 (WO2018013998)
  • 10.04.2019 - Publication A1 (EP3465349)

IPC Classification