Priority Date: 20.06.16 (EP 20160001379)

A RINSE COMPOSITION, A METHOD FOR FORMING RESIST PATTERNS AND A METHOD FOR MAKING SEMICONDUCTOR DEVICES

  • Application ID: EP17730191
  • Status: Request for examination was made

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Specialization

This EP application has the IPC class G03 (PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY). Merck Patent GmbH is specialized in G03. Here you find a list of all patent agent firms which are specialized in this IPC class. For a similar patent, they might be a good choice.

Timeline

  • 20.06.2016 - Priority Date (EP 20160001379)
  • 28.12.2017 - Publication A1 (WO2017220479)
  • 24.04.2019 - Publication A1 (EP3472671)

IPC Classification