Trench pattern wet chemical copper metal filling using a hard mask structure
- Application ID: EP14199374
- Status: █ APPLICATION DEEMED TO BE WITHDRAWN
This EP application has the IPC combination C23, C25, and H01. Atotech Deutschland GmbH is specialized in the combination C23, C25, and H01. We found, that Kailuweit & Uhlemann, Patentanwälte Rauschenbach, Hansen und Heeschen, IXAS Conseil are specialized in all of these IPC classes as well. For a similar patent, they might be a good choice.