Trench pattern wet chemical copper metal filling using a hard mask structure

  • Application ID: EP14199374
  • Status: APPLICATION DEEMED TO BE WITHDRAWN

Applicant

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Technology Company

Attorney

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Technology Company

Specialization

This EP application has the IPC combination C23, C25, and H01. Atotech Deutschland GmbH is specialized in the combination C23, C25, and H01. We found, that Kailuweit & Uhlemann, Patentanwälte Rauschenbach, Hansen und Heeschen, IXAS Conseil are specialized in all of these IPC classes as well. For a similar patent, they might be a good choice.

Timeline

  • 22.06.2016 - Publication A1 (EP3034655)