Lithography exposure device for lithographic exposure with single or multi-level laser project units with one or more wavelengths
- Application ID: EP14192305
- Status: █ APPLICATION DEEMED TO BE WITHDRAWN
This patent has the IPC class G03 (PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY) is specialized in G03. Here you find a list of all patent agent firms which are specialized in this IPC class. For a similar patent, they might be a good choice.
- 08.11.2013 - Priority Date (DE 20131018773)
- 13.05.2015 - Publication A2 (EP2871525)
- 23.09.2015 - Publication A3 (EP2871525)