Priority Date: 28.10.13 (US 201314064617)

Low pressure remote arc assisted magnetron sputtering system, and corresponding method

  • Application ID: EP14190737


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operating since 1974
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This patent has the IPC combination C23 (COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL) and H01 (BASIC ELECTRIC ELEMENTS) is specialized in the combination C23 and H01. We found, that Kailuweit & Uhlemann, Patentanwälte Rauschenbach, Patentanwaltskanzlei Dr. Steiniger, Bird Goën & Co NV, Troesch Scheidegger Werner AG and 25 others are specialized in all of these IPC classes. For a similar patent, they might be a good choice.


  • 28.10.2013 - Priority Date (US 201314064617)
  • 29.04.2015 - Publication A1 (EP2866246)

IPC Classification