Priority Date: 29.08.03 (JP 20030307771)

Exposure apparatus, liquid removing method, and device manufacturing method

  • Application ID: EP14175406
  • Status: PATENT GRANTED

Applicant

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Technology Company

Attorney

Employment test 51 - 200 employees
Company dna hoffmann eitle
operating since 1892
Headquarter in Munich and 4 offices
active in Legal Services and IP Portfolio Processing

Specialization

This patent has the IPC class G03 (PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY) Hoffmann Eitle PartmbB is specialized in G03. Here you find a list of all patent agent firms which are specialized in this IPC class. For a similar patent, they might be a good choice.

Timeline

  • 29.08.2003 - Priority Date (JP 20030307771)
  • 24.12.2014 - Publication A1 (EP2816410)
  • 17.08.2016 - Publication B1 (EP2816410)

IPC Classification