Priority Date: 11.06.13 (JP 20130122823)

Photoresist underlayer film-forming composition and pattern forming process

  • Application ID: EP14171724
  • Status: EXAMINATION REQUESTED

Applicant

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Specialization

This patent has the IPC class G03 (PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY) is specialized in G03. Here you find a list of all patent agent firms which are specialized in this IPC class. For a similar patent, they might be a good choice.

Timeline

  • 11.06.2013 - Priority Date (JP 20130122823)
  • 17.12.2014 - Publication A2 (EP2813889)
  • 31.12.2014 - Publication A3 (EP2813889)

IPC Classification