Priority Date: 18.09.09 (JP 20090218175)

Radiation-sensitive resin composition, method for forming resist pattern, polymer and polymerizable compound

  • Application ID: EP14157031
  • Status: EXAMINATION IN PROGRESS

Applicant

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Technology Company

Attorney

Employment test 51 - 200 employees
Company dna tbk patent
operating since 1972
1111.92
Headquarter in Munich
active in Legal Services and IP Consulting

Specialization

This patent has the IPC class G03 (PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY) TBK-Patent is specialized in G03. Here you find a list of all patent agent firms which are specialized in this IPC class. For a similar patent, they might be a good choice.

Timeline

  • 18.09.2009 - Priority Date (JP 20090218175)
  • 24.09.2014 - Publication A2 (EP2781959)
  • 15.04.2015 - Publication A3 (EP2781959)

IPC Classification