Priority Date: 31.05.13 (JP 20130116250)

Dry etching method, dry etching apparatus, metal film, and device including the metal film

  • Application ID: EP14001853


Technology company logo small
Technology Company


operating since 1876
Headquarter in Hamburg and 2 offices
active in Legal Services and IP Consulting
Employment test 11 - 50 employees
Company dna von kreisler selting werner
operating since 1947
Headquarter in Cologne and 3 offices
active in Legal Services and IP Portfolio Processing
Employment test 1 - 10 employees
Company dna hossle patentanwalte
operating since 1963
Headquarter in Stuttgart and 1 office
active in Legal Services


This EP application has the IPC combination C23 (COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL) and H01 (BASIC ELECTRIC ELEMENTS). We found, that Kailuweit & Uhlemann, Patentanwälte Rauschenbach, Meissner Bolte & Partnerschaft mbB, ip21 Ltd, Troesch Scheidegger Werner AG and 25 others are specialized in this combination either. For a similar patent, they might be a good choice.


  • 31.05.2013 - Priority Date (JP 20130116250)
  • 03.12.2014 - Publication A1 (EP2808423)

IPC Classification