Priority Date: 19.12.12 (JP 20120276883)

TANTALUM SPUTTERING TARGET AND METHOD FOR PRODUCING SAME

  • Application ID: EP13866236
  • Status: GRANT OF PATENT INTENDED

Applicant

Attorney

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Specialization

This EP application has the IPC combination C23 (COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL) and H01 (BASIC ELECTRIC ELEMENTS). We found, that Kailuweit & Uhlemann, Riechelmann & Carlsohn GbR, Patentanwälte Rauschenbach, Bird Goën & Co NV, Troesch Scheidegger Werner AG and 25 others are specialized in this combination either. For a similar patent, they might be a good choice.

Timeline

  • 19.12.2012 - Priority Date (JP 20120276883)
  • 26.06.2014 - Publication A1 (WO2014097897)
  • 03.06.2015 - Publication A1 (EP2878699)

IPC Classification