Priority Date: 30.07.12 (JP 20120168728)

COMPOSITION FOR FORMING UNDERLAYER FILM FOR SILICON-CONTAINING EUV RESIST AND CONTAINING ONIUM SULFONATE

  • Application ID: EP13825237
  • Status: GRANT OF PATENT INTENDED

Applicant

Attorney

Employment test 51 - 200 employees
Company dna hoffmann eitle
operating since 1892
Headquarter in Munich and 4 offices
active in Legal Services and IP Portfolio Processing

Specialization

This patent has the IPC combination G03 (PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY) and H01 (BASIC ELECTRIC ELEMENTS) Hoffmann Eitle PartmbB is specialized in the combination G03 and H01. We found, that Kuhnen & Wacker, Klunker Schmitt-Nilson Hirsch Patentanwälte (KSNH) Klunker IP Patentanwälte PartG mbB, Bird Goën & Co NV, Becker Kurig Straus, Beetz & Partner and 11 others are specialized in all of these IPC classes as well. For a similar patent, they might be a good choice.

Timeline

  • 30.07.2012 - Priority Date (JP 20120168728)
  • 06.02.2014 - Publication A1 (WO2014021256)
  • 10.06.2015 - Publication A1 (EP2881794)

IPC Classification