Priority Date: 12.06.12 (US 201261658745P)

LINEAR STAGE AND METROLOGY ARCHITECTURE FOR REFLECTIVE ELECTRON BEAM LITHOGRAPHY

  • Application ID: EP13804795
  • Status: GRANT OF PATENT INTENDED

Applicant

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Technology Company

Attorney

operating since 1927
Headquarter in Dublin and 1 office
active in Legal Services

Specialization

This patent has the IPC combination G03 (PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY) and H01 (BASIC ELECTRIC ELEMENTS) is specialized in the combination G03 and H01. We found, that Kuhnen & Wacker, Hoffmann Eitle PartmbB, Klunker Schmitt-Nilson Hirsch Patentanwälte (KSNH) Klunker IP Patentanwälte PartG mbB, Bird Goën & Co NV, Becker Kurig Straus and 12 others are specialized in all of these IPC classes. For a similar patent, they might be a good choice.

Timeline

  • 12.06.2012 - Priority Date (US 201261658745P)
  • 19.12.2013 - Publication A1 (WO2013188547)
  • 15.04.2015 - Publication A1 (EP2859577)

IPC Classification