Priority Date: 22.03.12 (JP 20120065659)

NOVEL COMPOUND AND PHOTOSENSITIVE RESIN COMPOSITION

  • Application ID: EP13764684
  • Status: GRANT OF PATENT INTENDED

Applicant

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Technology Company

Attorney

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Headquarter in Munich
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Specialization

This patent has the IPC combination C07 (ORGANIC CHEMISTRY) and G03 (PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY) is specialized in the combination C07 and G03. We found, that Hoffmann Eitle PartmbB, Plougmann & Vingtoft A/S, Bird Go├źn & Co NV, Becker Kurig Straus, Kotitschke & Heurung Partnerschaft and 4 others are specialized in all of these IPC classes. For a similar patent, they might be a good choice.

Timeline

  • 22.03.2012 - Priority Date (JP 20120065659)
  • 26.09.2013 - Publication A1 (WO2013141014)
  • 28.01.2015 - Publication A1 (EP2829534)