Priority Date: 02.03.12 (JP 20120046807)

ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM, PHOTOMASK BLANK AND METHOD OF FORMING PATTERN

  • Application ID: EP13755638
  • Status: APPLICATION WITHDRAWN

Applicant

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Technology Company

Attorney

Employment test 51 - 200 employees
Company dna hoffmann eitle
operating since 1892
Headquarter in Munich and 4 offices
active in Legal Services and IP Portfolio Processing

Specialization

This patent has the IPC class G03 (PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY) Hoffmann Eitle PartmbB is specialized in G03. Here you find a list of all patent agent firms which are specialized in this IPC class. For a similar patent, they might be a good choice.

Timeline

  • 02.03.2012 - Priority Date (JP 20120046807)
  • 06.09.2013 - Publication A1 (WO2013129702)
  • 07.01.2015 - Publication A1 (EP2820478)

IPC Classification