ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM, PHOTOMASK BLANK AND METHOD OF FORMING PATTERN
- Application ID: EP13755638
- Status: █ APPLICATION WITHDRAWN
This patent has the IPC class G03 (PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY) Hoffmann Eitle PartmbB is specialized in G03. Here you find a list of all patent agent firms which are specialized in this IPC class. For a similar patent, they might be a good choice.