Priority Date: 12.06.12 (US 201261658654P)

PHOTON SOURCE, METROLOGY APPARATUS, LITHOGRAPHIC SYSTEM AND DEVICE MANUFACTURING METHOD

  • Application ID: EP13724291
  • Status: GRANT OF PATENT INTENDED

Applicant

Technology company logo small
Technology Company

Attorney

no operation time available
2 offices
Technology Company

Specialization

This patent has the IPC combination G01, G03, H01, and H05 is specialized in the combination G01, G03, H01, and H05. There is no patent agent firm in the market, which is specialized in this combination of IPC classes.

Timeline

  • 12.06.2012 - Priority Date (US 201261658654P)
  • 03.01.2014 - Publication A1 (WO2014000998)
  • 15.04.2015 - Publication A1 (EP2859410)