Priority Date: 27.06.00 (JP 20000193104)

Inspection system by charged particle beam and method of manufacturing devices using the system

  • Application ID: EP13000328
  • Status: EXAMINATION IN PROGRESS

Applicants

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Specialization

This EP application has the IPC combination G03 (PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY) and H01 (BASIC ELECTRIC ELEMENTS). We found, that Viering, Jentschura & Partner mbB Patent- und Rechtsanwälte, Kuhnen & Wacker, Hoffmann Eitle PartmbB, Klunker Schmitt-Nilson Hirsch Patentanwälte (KSNH) Klunker IP Patentanwälte PartG mbB, Bird Goën & Co NV and 10 others are specialized in this combination either. For a similar patent, they might be a good choice.

Timeline

  • 27.06.2000 - Priority Date (JP 20000193104)
  • 01.05.2013 - Publication A1 (EP2587515)