Priority Date: 26.12.11 (JP 20110282963)

PHOTOSENSITIVE RESIN COMPOSITION AND PROCESS FOR PRODUCING SEMICONDUCTOR ELEMENT

  • Application ID: EP12861162
  • Status: GRANT OF PATENT INTENDED

Applicant

Technology company logo small
Technology Company

Attorney

Employment test 11 - 50 employees
Company dna kador and partner
operating since 1974
1000.44
Headquarter in Munich and 3 offices
active in Legal Services, IP Consulting, and IP-related Communication Service

Specialization

This patent has the IPC class G03 (PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY) is specialized in G03. Here you find a list of all patent agent firms which are specialized in this IPC class. For a similar patent, they might be a good choice.

Timeline

  • 26.12.2011 - Priority Date (JP 20110282963)
  • 04.07.2013 - Publication A1 (WO2013099785)
  • 05.11.2014 - Publication A1 (EP2799928)