Priority Date: 30.09.11 (JP 20110218549)

PATTERN-FORMING METHOD, ELECTRON BEAM-SENSITIVE OR EXTREME ULTRAVIOLET RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE USING THEM AND ELECTRONIC DEVICE

  • Application ID: EP12834887
  • Status: APPLICATION DEEMED TO BE WITHDRAWN

Applicant

Technology company logo small
Technology Company

Attorney

Employment test 51 - 200 employees
Company dna hoffmann eitle
operating since 1892
Headquarter in Munich and 6 offices
active in Legal Services and IP Portfolio Processing

Specialization

This EP application has the IPC class G03 (PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY) and H01 (BASIC ELECTRIC ELEMENTS). Hoffmann Eitle PartmbB is specialized in the combination G03 and H01. We found, that Kuhnen & Wacker, Klunker Schmitt-Nilson Hirsch Patentanwälte (KSNH) Klunker IP Patentanwälte PartG mbB, Bird Goën & Co NV, Becker Kurig Straus, Beetz & Partner and 8 others are specialized in all of these IPC classes as well. For a similar patent, they might be a good choice.

Timeline

  • 30.09.2011 - Priority Date (JP 20110218549)
  • 04.04.2013 - Publication A1 (WO2013047091)
  • 06.08.2014 - Publication A1 (EP2761372)