PATTERN-FORMING METHOD, ELECTRON BEAM-SENSITIVE OR EXTREME ULTRAVIOLET RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE USING THEM AND ELECTRONIC DEVICE
- Application ID: EP12831380
- Status: █ GRANT OF PATENT INTENDED
This EP application has the IPC combination C08, G03, and H01. Hoffmann Eitle PartmbB is specialized in the combination C08, G03, and H01. We found, that SCHAEFER Patent, Trademark & Design Matthias Schäfer, Dres. Fitzner Rechts- und Patentanwälte are specialized in all of these IPC classes as well. For a similar patent, they might be a good choice.