Priority Date: 15.09.11 (JP 20110202044)

PATTERN-FORMING METHOD, ELECTRON BEAM-SENSITIVE OR EXTREME ULTRAVIOLET RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE USING THEM AND ELECTRONIC DEVICE

  • Application ID: EP12831380
  • Status: GRANT OF PATENT INTENDED

Applicant

Technology company logo small
Technology Company

Attorney

Employment test 51 - 200 employees
Company dna hoffmann eitle
operating since 1892
Headquarter in Munich and 6 offices
active in Legal Services and IP Portfolio Processing

Specialization

This EP application has the IPC combination C08, G03, and H01. Hoffmann Eitle PartmbB is specialized in the combination C08, G03, and H01. We found, that Patentanwälte Gierlich & Pischitzis Partnerschaft, SCHAEFER Patent, Trademark & Design Matthias Schäfer, Dres. Fitzner Rechts- und Patentanwälte are specialized in all of these IPC classes as well. For a similar patent, they might be a good choice.

Timeline

  • 15.09.2011 - Priority Date (JP 20110202044)
  • 21.03.2013 - Publication A1 (WO2013039243)
  • 23.07.2014 - Publication A1 (EP2756353)