Priority Date: 23.11.11 (US 201161563433P)

METHOD FOR FORMING METAL SILICIDE LAYERS

  • Application ID: EP12797813
  • Status: PATENT GRANTED

Applicants

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Technology Company
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Attorney

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Specialization

This patent has the IPC class H01 (BASIC ELECTRIC ELEMENTS) is specialized in H01. Here you find a list of all patent agent firms which are specialized in this IPC class. For a similar patent, they might be a good choice.

Timeline

  • 23.11.2011 - Priority Date (US 201161563433P)
  • 30.05.2013 - Publication A1 (WO2013076267)
  • 01.10.2014 - Publication A1 (EP2783396)
  • 11.01.2017 - Publication B1 (EP2783396)

IPC Classification