Priority Date: 06.10.11 (GB 20110017279)

ETCHED SILICON STRUCTURES, METHOD OF FORMING ETCHED SILICON STRUCTURES AND USES THEREOF

  • Application ID: EP12772390
  • Status: PATENT GRANTED

Applicant

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Technology Company

Attorney

operating since 1947
Headquarter in London and 5 offices
active in Legal Services and IP Consulting

Specialization

This EP application has the IPC class B44 (DECORATIVE ARTS) and H01 (BASIC ELECTRIC ELEMENTS). We found, that Kaufmann Patent- und Rechtsanwälte, Gramm, Lins & Partner Patent- und Rechtsanwälte PartGmbB, Michalski Hüttermann & Partner are specialized in this combination either. For a similar patent, they might be a good choice.

Timeline

  • 06.10.2011 - Priority Date (GB 20110017279)
  • 11.04.2013 - Publication A1 (WO2013050785)
  • 13.08.2014 - Publication A1 (EP2764563)
  • 21.09.2016 - Publication B1 (EP2764563)