Priority Date: 06.10.11 (GB 20110017279)

ETCHED SILICON STRUCTURES, METHOD OF FORMING ETCHED SILICON STRUCTURES AND USES THEREOF

  • Application ID: EP12772390
  • Status: PATENT GRANTED

Applicant

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Technology Company

Attorney

operating since 1947
Headquarter in London and 5 offices
active in Legal Services and IP Consulting

Specialization

This patent has the IPC combination B44 (DECORATIVE ARTS) and H01 (BASIC ELECTRIC ELEMENTS) is specialized in the combination B44 and H01. We found, that Kaufmann Patent- und Rechtsanwälte, Gramm, Lins & Partner Patent- und Rechtsanwälte PartGmbB are specialized in all of these IPC classes. For a similar patent, they might be a good choice.

Timeline

  • 06.10.2011 - Priority Date (GB 20110017279)
  • 11.04.2013 - Publication A1 (WO2013050785)
  • 13.08.2014 - Publication A1 (EP2764563)
  • 21.09.2016 - Publication B1 (EP2764563)