Priority Date: 10.08.11 (EP 20110177166)

METHOD AND APPARATUS FOR DEPOSITING ATOMIC LAYERS ON A SUBSTRATE

  • Application ID: EP12748571
  • Status: EXAMINATION IN PROGRESS

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Specialization

This patent has the IPC class C23 (COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL) is specialized in C23. Here you find a list of all patent agent firms which are specialized in this IPC class. For a similar patent, they might be a good choice.

Timeline

  • 10.08.2011 - Priority Date (EP 20110177166)
  • 14.02.2013 - Publication A1 (WO2013022339)
  • 18.06.2014 - Publication A1 (EP2742167)