Priority Date: 05.08.11 (US 201161515716P)

RADIATION SOURCE AND METHOD FOR LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

  • Application ID: EP12740518
  • Status: NO OPPOSITION FILED WITHIN TIMELIMIT

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Specialization

This patent has the IPC class H05 (ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR) is specialized in H05. Here you find a list of all patent agent firms which are specialized in this IPC class. For a similar patent, they might be a good choice.

Timeline

  • 05.08.2011 - Priority Date (US 201161515716P)
  • 14.02.2013 - Publication A1 (WO2013020758)
  • 25.06.2014 - Publication A1 (EP2745648)
  • 20.01.2016 - Publication B1 (EP2745648)

IPC Classification