Priority Date: 08.07.11 (US 201161505768P)

LITHOGRAPHIC PATTERNING PROCESS AND RESISTS TO USE THEREIN

  • Application ID: EP12725373
  • Status: GRANT OF PATENT INTENDED

Applicant

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Technology Company

Attorney

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Technology Company

Specialization

This patent has the IPC combination C08 (ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON) and G03 (PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY) is specialized in the combination C08 and G03. We found, that Hoffmann Eitle PartmbB, Kotitschke & Heurung Partnerschaft, Weser & Kollegen, Studio Ponzellini Gioia e Associati Srl, Patentanwälte Gierlich & Pischitzis Partnerschaft and 2 others are specialized in all of these IPC classes. For a similar patent, they might be a good choice.

Timeline

  • 08.07.2011 - Priority Date (US 201161505768P)
  • 17.01.2013 - Publication A1 (WO2013007442)
  • 14.05.2014 - Publication A1 (EP2729844)

IPC Classification