METHODS AND MATERIALS FOR LITHOGRAPHY OF A HIGH RESOLUTION HSQ RESIST
- Application ID: EP12722085
- Status: █ APPLICATION DEEMED TO BE WITHDRAWN
This patent has the IPC combination G03 (PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY) and H01 (BASIC ELECTRIC ELEMENTS) is specialized in the combination G03 and H01. We found, that Kuhnen & Wacker, Hoffmann Eitle PartmbB, Klunker Schmitt-Nilson Hirsch Patentanwälte (KSNH) Klunker IP Patentanwälte PartG mbB, Bird Goën & Co NV, Becker Kurig Straus and 12 others are specialized in all of these IPC classes. For a similar patent, they might be a good choice.