Priority Date: 22.04.11 (EP 20110163598)

METHODS AND MATERIALS FOR LITHOGRAPHY OF A HIGH RESOLUTION HSQ RESIST

  • Application ID: EP12722085
  • Status: APPLICATION DEEMED TO BE WITHDRAWN

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Specialization

This patent has the IPC combination G03 (PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY) and H01 (BASIC ELECTRIC ELEMENTS) is specialized in the combination G03 and H01. We found, that Kuhnen & Wacker, Hoffmann Eitle PartmbB, Bird Go├źn & Co NV, Becker Kurig Straus, Beetz & Partner and 11 others are specialized in all of these IPC classes. For a similar patent, they might be a good choice.

Timeline

  • 22.04.2011 - Priority Date (EP 20110163598)
  • 26.10.2012 - Publication A1 (WO2012143446)
  • 26.02.2014 - Publication A1 (EP2700088)

IPC Classification