Priority Date: 18.03.11 (GB 20110004581)

PHOTOPATTERNABLE STRUCTURE CONTAINING SUBSTRATE WITH TWO-SIDE PHOTORESIST COATINGS

  • Application ID: EP12706905
  • Status: NO OPPOSITION FILED WITHIN TIMELIMIT

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Specialization

This EP application has the IPC class G03 (PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY) and G06 (COMPUTING; CALCULATING; COUNTING). We found, that KOPPEL patendibüroo OÜ, Bird Goën & Co NV, Becker Kurig Straus, Schwabe Sandmair Marx, IPLodge bvba and 9 others are specialized in this combination either. For a similar patent, they might be a good choice.

Timeline

  • 18.03.2011 - Priority Date (GB 20110004581)
  • 27.09.2012 - Publication A1 (WO2012127205)
  • 22.01.2014 - Publication A1 (EP2686735)
  • 06.01.2016 - Publication B1 (EP2686735)

IPC Classification