Priority Date: 07.10.11 (DE 20111084137)

Apparatus and process for deposition of polycrystalline silicon

  • Application ID: EP12186827
  • Status: NO OPPOSITION FILED WITHIN TIMELIMIT

Applicant

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Attorney

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Specialization

This EP application has the IPC combination C01 (INORGANIC CHEMISTRY) and C23 (COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL). We found, that Kailuweit & Uhlemann, Patentanwälte Rauschenbach, Schmauder & Partner AG, WSL Patentanwälte PartGes mbB, Schwan Schorer & Partner Patentanwälte mbB and 5 others are specialized in this combination either. For a similar patent, they might be a good choice.

Timeline

  • 07.10.2011 - Priority Date (DE 20111084137)
  • 10.04.2013 - Publication A1 (EP2578724)
  • 29.04.2015 - Publication B1 (EP2578724)

IPC Classification