Priority Date: 29.11.11 (JP 20110260525)

Silicon-containing resist underlayer film-forming composition and patterning process

  • Application ID: EP12007830
  • Status: PATENT GRANTED

Applicant

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Specialization

This EP application has the IPC combination C08, C09, and H01. We found, that Patentanwälte Rauschenbach, Hoffmann Eitle PartmbB, Ter Meer Steinmeister & Partner PartGmbB, Boeters & Lieck, Twelmeier Mommer & Partner and 15 others are specialized in this combination either. For a similar patent, they might be a good choice.

Timeline

  • 29.11.2011 - Priority Date (JP 20110260525)
  • 05.06.2013 - Publication A1 (EP2599819)
  • 01.02.2017 - Publication B1 (EP2599819)