Silicon-containing resist underlayer film-forming composition and patterning process
- Application ID: EP12007830
- Status: █ PATENT GRANTED
This EP application has the IPC class C08, C09, and H01. We found, that Patentanwälte Rauschenbach, Hoffmann Eitle PartmbB, Ter Meer Steinmeister & Partner PartGmbB, Stolmár & Partner Patentanwälte PartG mbB, Boeters & Lieck and 16 others are specialized in this combination either. For a similar patent, they might be a good choice.