Priority Date: 28.06.11 (JP 20110142657)

Composition for forming resist underlayer film and patterning process using the same

  • Application ID: EP12004626
  • Status: PATENT GRANTED

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Specialization

This EP application has the IPC class C08 (ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON) and C09 (DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR). We found, that Manfred Köhler und Kollegen, Sperling Fischer & Heyner, Patentanwälte Rauschenbach, Lederer Keller Patentanwälte Partnerschaft mbB, Hoffmann Eitle PartmbB and 88 others are specialized in this combination either. For a similar patent, they might be a good choice.

Timeline

  • 28.06.2011 - Priority Date (JP 20110142657)
  • 02.01.2013 - Publication A1 (EP2540780)
  • 20.07.2016 - Publication B1 (EP2540780)

IPC Classification