Priority Date: 10.08.10 (WO 2010IB53612)

MODIFIED MASK FOR PHOTOLITHOGRAPHY OF A WAFER WITH RECESS

  • Application ID: EP11782672
  • Status: GRANT OF PATENT INTENDED

Attorney

Employment test 51 - 200 employees
Company dna hoffmann eitle
operating since 1892
Headquarter in Munich and 6 offices
active in Legal Services and IP Portfolio Processing

Specialization

This EP application has the IPC class G03 (PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY). Hoffmann Eitle PartmbB is specialized in G03. Here you find a list of all patent agent firms which are specialized in this IPC class. For a similar patent, they might be a good choice.

Timeline

  • 10.08.2010 - Priority Date (WO 2010IB53612)
  • 16.02.2012 - Publication A2 (WO2012020382)
  • 19.06.2013 - Publication A2 (EP2603835)

IPC Classification