Priority Date: 22.03.10 (US 20100316056P)

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

  • Application ID: EP11706786
  • Status: PATENT GRANTED

Applicant

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Specialization

This EP application has the IPC class G03 (PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY). ASML Netherlands B.V. is specialized in G03. ASML Netherlands B.V. is specialised in G03 (PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY). Here you find a list of all patent agent firms which are specialized in this IPC class. For a similar patent, they might be a good choice.

Timeline

  • 22.03.2010 - Priority Date (US 20100316056P)
  • 01.09.2011 - Publication A1 (WO2011104172)
  • 02.01.2013 - Publication A1 (EP2539771)
  • 01.02.2017 - Publication B1 (EP2539771)

IPC Classification