Apparatus and Method for depositing Hydrogen-free ta C Layers on Workpieces and Workpiece

  • Application ID: EP11008717
  • Status: The patent has been granted

Attorney

Employment test 51 - 200 employees
Company dna manitz finsterwald and partner gbr
no operation time available
Headquarter in Munich, Berlin
active in Legal Services, IP Consulting, and IP Portfolio Processing

Specialization

This EP application has the IPC combination C23 (COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL) and H01 (BASIC ELECTRIC ELEMENTS). We found, that Kailuweit & Uhlemann, Riechelmann & Carlsohn GbR, Patentanwälte Rauschenbach, Bird Goën & Co NV, Troesch Scheidegger Werner AG and 25 others are specialized in this combination either. For a similar patent, they might be a good choice.

Timeline

  • 01.05.2013 - Publication A1 (EP2587518)
  • 19.12.2018 - Publication B1 (EP2587518)

IPC Classification