Priority Date: 25.10.02 (US 20020421464P)

Lithography system

  • Application ID: EP10184795
  • Status: No opposition filed within time limit


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This EP application has the IPC combination G03 (PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY) and H01 (BASIC ELECTRIC ELEMENTS). We found, that Viering, Jentschura & Partner mbB Patent- und Rechtsanwälte, Kuhnen & Wacker, Hoffmann Eitle PartmbB, Klunker Schmitt-Nilson Hirsch Patentanwälte (KSNH) Klunker IP Patentanwälte PartG mbB, Bird Goën & Co NV and 10 others are specialized in this combination either. For a similar patent, they might be a good choice.


  • 25.10.2002 - Priority Date (US 20020421464P)
  • 22.06.2011 - Publication A1 (EP2336830)
  • 21.09.2016 - Publication B1 (EP2336830)

IPC Classification