Priority Date: 19.02.09 (US 20090153941P)

A lithographic apparatus, a method of controlling the apparatus and a device manufacturing method

  • Application ID: EP10151945
  • Status: Request for examination was made

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Specialization

This EP application has the IPC class G03 (PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY). ASML Netherlands B.V. is specialized in G03. ASML Netherlands B.V. is specialised in G03 (PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY). Here you find a list of all patent agent firms which are specialized in this IPC class. For a similar patent, they might be a good choice.

Timeline

  • 19.02.2009 - Priority Date (US 20090153941P)
  • 25.08.2010 - Publication A2 (EP2221669)
  • 09.02.2011 - Publication A3 (EP2221669)

IPC Classification