Priority Date: 09.12.08 (US 20080193598P)

Lithographic apparatus and device manufacturing method

  • Application ID: EP09176506
  • Status: The application has been refused

Applicant

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Technology Company

Attorneys

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Technology Company
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Technology Company

Specialization

This EP application has the IPC class G03 (PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY). ASML Netherlands B.V. is specialized in G03. ASML Netherlands B.V., ASML Netherlands B.V. is specialised in G03 (PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY). Here you find a list of all patent agent firms which are specialized in this IPC class. For a similar patent, they might be a good choice.

Timeline

  • 09.12.2008 - Priority Date (US 20080193598P)
  • 16.06.2010 - Publication A2 (EP2196857)
  • 21.07.2010 - Publication A3 (EP2196857)

IPC Classification