Priority Date: 19.12.07 (US 20070006117)

RADIATION SOURCE, LITHOGRAPHIC APPARATUS AND METHOD OF PRODUCING RADIATION

  • Application ID: EP08863152
  • Status: No opposition filed within time limit

Applicant

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Specialization

This EP application has the IPC class H05 (ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR). ASML Netherlands B.V. is specialised in H05 (ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR). Here you find a list of all patent agent firms which are specialized in this IPC class. For a similar patent, they might be a good choice.

Timeline

  • 19.12.2007 - Priority Date (US 20070006117)
  • 25.06.2009 - Publication A1 (WO2009078722)
  • 25.08.2010 - Publication A1 (EP2220915)
  • 27.06.2012 - Publication B1 (EP2220915)

IPC Classification