Priority Date: 11.09.07 (JP 20070235852)

COMPOSITION CONTAINING POLYMER HAVING NITROGENOUS SILYL GROUP FOR FORMING RESIST UNDERLAYER FILM

  • Application ID: EP08831233
  • Status: No opposition filed within time limit

Applicant

Attorney

Employment test 51 - 200 employees
Company dna hoffmann eitle
operating since 1892
Headquarter in Munich and 6 offices
active in Legal Services and IP Portfolio Processing

Specialization

This EP application has the IPC combination G03 (PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY) and H01 (BASIC ELECTRIC ELEMENTS). Hoffmann Eitle PartmbB is specialized in the combination G03 and H01. We found, that Viering, Jentschura & Partner mbB Patent- und Rechtsanwälte, Kuhnen & Wacker, Klunker Schmitt-Nilson Hirsch Patentanwälte (KSNH) Klunker IP Patentanwälte PartG mbB, Bird Goën & Co NV, Becker Kurig Straus and 9 others are specialized in all of these IPC classes as well. For a similar patent, they might be a good choice.

Timeline

  • 11.09.2007 - Priority Date (JP 20070235852)
  • 19.03.2009 - Publication A1 (WO2009034998)
  • 16.06.2010 - Publication A1 (EP2196854)
  • 06.11.2013 - Publication B1 (EP2196854)