Priority Date: 28.06.07 (US 20070769766)

RADIATION-SENSITIVE COMPOSITIONS AND ELEMENTS WITH SOLVENT RESISTANT POLY(VINYL ACETAL)S

  • Application ID: EP08768429
  • Status: The application has been withdrawn

Applicant

Technology company logo small
Technology Company

Attorney

Employment test 51 - 200 employees
Company dna vossius and partner
operating since 1961
Headquarter in Munich and 3 offices
active in Legal Services and IP-related Communication Service

Specialization

This EP application has the IPC combination B41 (PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS) and G03 (PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY). We found, that Hoffmann Eitle PartmbB, Klunker Schmitt-Nilson Hirsch Patentanwälte (KSNH) Klunker IP Patentanwälte PartG mbB, Weser & Kollegen, Océ-Technologies B.V., Cabinet Fédit-Loriot SA and 5 others are specialized in this combination either. For a similar patent, they might be a good choice.

Timeline

  • 28.06.2007 - Priority Date (US 20070769766)
  • 08.01.2009 - Publication A1 (WO2009005582)
  • 10.03.2010 - Publication A1 (EP2160650)

IPC Classification