Priority Date: 20.09.06 (US 20060523743)

Lithographic apparatus and device manufacturing method

  • Application ID: EP07253692
  • Status: No opposition filed within time limit

Applicant

Technology company logo small
Technology Company

Attorneys

no operation time available
2 offices
Technology Company
no operation time available
1288.54
Headquarter in London and 4 offices
active in Legal Services, IP Consulting, and IP Portfolio Processing
no operation time available
2 offices
Technology Company

Specialization

This EP application has the IPC class G03 (PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY). ASML Netherlands B.V. is specialized in G03. ASML Netherlands B.V., J A Kemp, ASML Netherlands B.V. is specialised in G03 (PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY). Here you find a list of all patent agent firms which are specialized in this IPC class. For a similar patent, they might be a good choice.

Timeline

  • 20.09.2006 - Priority Date (US 20060523743)
  • 26.03.2008 - Publication A1 (EP1903398)
  • 19.01.2011 - Publication B1 (EP1903398)

IPC Classification