Priority Date: 13.11.06 (US 20060007904P)

Conduit system for a lithographic apparatus, lithographic apparatus, pump, and method for substantially reducing vibrations in a conduit system

  • Application ID: EP07075932
  • Status: Request for examination was made

Applicant

Technology company logo small
Technology Company

Attorneys

no operation time available
2 offices
Technology Company
no operation time available
2 offices
Technology Company
operating since 1939
6 offices
active in Legal Services, IP Consulting, and IP Portfolio Processing

Specialization

This EP application has the IPC class G03 (PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY). ASML Netherlands B.V. is specialized in G03. ASML Netherlands B.V., ASML Netherlands B.V., Exter Polak & Charlouis B.V. (EP & C) is specialised in G03 (PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY). Here you find a list of all patent agent firms which are specialized in this IPC class. For a similar patent, they might be a good choice.

Timeline

  • 13.11.2006 - Priority Date (US 20060007904P)
  • 14.05.2008 - Publication A2 (EP1921503)
  • 03.08.2011 - Publication A3 (EP1921503)

IPC Classification